YOKOHAMA—After a decade of development, Canon Inc. began selling lithography equipment for semiconductor production, hoping to reclaim a share in the market. The equipment is used to print fine ...
TOKYO--(BUSINESS WIRE)--Dai Nippon Printing Co., Ltd. (DNP, TOKYO: 7912) has successfully achieved the fine pattern resolution required for photomasks for logic semiconductors of the beyond 2nm (nm: ...
The Centre for Process Innovation (CPI) and Heidelberg Instruments have developed a high resolution, high speed roll to roll digital lithography tool for the manufacture of flexible organic thin film ...
To build optoelectronic circuits, researchers need to make films of semiconductor nanocrystals in desired patterns, just as they can with conventional silicon-based electronics. But the techniques ...
(Nanowerk News) Toshiba Corporation and the National Institute of Advanced Industrial Science and Technology (AIST) today announced joint development of a mask pattern optimizing technology that ...
SAN JOSE, Calif. — Lam Research Corp. has rolled out the 2300 Motif, a post-lithography pattern enhancement system. Based on a proprietary plasma-assisted process, the new system delivers ...
Directed self-assembly (DSA) is moving back onto the patterning radar screen amid ongoing challenges in lithography. Intel continues to have a keen interest in DSA, while other chipmakers are taking ...
2019 marked an important milestone for extreme ultraviolet (EUV) lithography. In that year, the EUV patterning technology was for the first time deployed for the mass production of logic chips of the ...
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