Electron lithography enables sub-100-nanometer patterning of a fully water-based hydrogel resist.
TOKYO--(BUSINESS WIRE)--Dai Nippon Printing Co., Ltd. (DNP, TOKYO: 7912) has successfully achieved the fine pattern resolution required for photomasks for logic semiconductors of the beyond 2nm (nm: ...
To build optoelectronic circuits, researchers need to make films of semiconductor nanocrystals in desired patterns, just as they can with conventional silicon-based electronics. But the techniques ...
SAN JOSE, Calif. — Lam Research Corp. has rolled out the 2300 Motif, a post-lithography pattern enhancement system. Based on a proprietary plasma-assisted process, the new system delivers ...
(Nanowerk News) Toshiba Corporation and the National Institute of Advanced Industrial Science and Technology (AIST) today announced joint development of a mask pattern optimizing technology that ...
A new startup has emerged and unveiled a technology that addresses one of the bigger but less understood problems in advanced lithography–pattern roughness. The startup, called Fractilia, is a ...
Lithography, based on conventional ink-printing processes, is a technique for patterning a variety of layers, such as conductors, semiconductors, or dielectrics, on a surface. Nanopatterning stretches ...
Explore photolithography and lithography tools at the Materials for Opto/Electronics Research and Education (MORE) Center at Case Western Reserve University. Photolithography uses UV sensitive ...
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